Cover image for Microlithography : science and technology
Microlithography : science and technology
2nd ed.
Publication Information:
Boca Raton, FL : CRC, 2007
Physical Description:
848 p. : ill. ; 27 cm.
Added Author:


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Call Number
Material Type
Item Category 1
PSZ JB 30000010209817 TK7836 M54 2007 Open Access Book

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This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts.

New in the Second Edition
In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including:
Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry

Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition.

Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.

Table of Contents

Michael S. HibbsChris A. MackBruce W. SmithPalash DasGregg M. GallatinKazuaki SuzukiTakumi UenoStefan Wurm and Charles GwynDouglas J. ResnickTakumi Ueno and Robert D. AllenBruce W. SmithBruce W. Smith and Maureen HanrattyRoderick R. KunzHerschel M. Marchman and Gian Lorusso and Mike Adel and Sanjay YedurElizabeth A. Dobisz and Zvonimir Z. Bandic and Martin C. Peckerar
Part I Exposure System
1 System Overview of Optical Steppers and Scannersp. 3
2 Optical Lithography Modelingp. 97
3 Optics for Photolithographyp. 149
4 Excimer Laser for Advanced Microlithographyp. 243
5 Alignment and Overlayp. 287
6 Electron Beam Lithography Systemsp. 329
7 X-ray Lithographyp. 361
8 EUV Lithographyp. 383
9 Imprint Lithographyp. 465
Part II Resists and Processing
10 Chemistry of Photoresist Materialsp. 503
11 Resist Processingp. 587
12 Multilayer Resist Technologyp. 637
13 Dry Etching of Photoresistsp. 675
Part III Metrology and Nanolithography
14 Critical-Dimensional Metrology for Integrated-Circuit Technologyp. 701
15 Electron Beam Nanolithographyp. 799
Indexp. 837